NDS8926 Dual N-Channel Enhancement Mode Field Effect Transistor
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July 1996 NDS8926 Dual N-Channel Enhancement Mode Field Effect Transistor These N-Channel enhancement mode power field effect transistors are produced using Fairchild's proprietary, high cell density, DMOS technology. This very high density process is especially tailored to minimize on-state resistance and provide superior switching performance. These devices are particularly suited for low voltage applications such as DC motor control and DC/DC conversion where fast switching, low in-line power loss, and resistance to transients are needed. A, 20 V. RDS ON = VGS = V RDS ON = VGS = V. High density cell design for extremely low RDS ON . High power and current handling capability in a widely used surface mount package. Dual MOSFET in surface mount package. Absolute Maximum Ratings TA = 25°C unless otherwise note Symbol Parameter VDSS Drain-Source Voltage VGSS Gate-Source Voltage Drain Current - Continuous - Pulsed Note 1a Power Dissipation for Dual Operation Power Dissipation for Single Operation Note 1a Note1b Note1c TJ,TSTG Operating and Storage Temperature Range THERMAL CHARACTERISTICS Thermal Resistance, Junction-to-Ambient Note 1a Thermal Resistance, Junction-to-Case Note 1 1997 Fairchild Semiconductor Corporation NDS8926 20 8 20 2 1 -55 to 150 Units V A W °C °C/W °C/W ELECTRICAL CHARACTERISTICS TA = 25°C unless otherwise noted Symbol Parameter Conditions OFF CHARACTERISTICS BVDSS IDSS Drain-Source Breakdown Voltage Zero Gate Voltage Drain Current VGS = 0 V, ID = 250 µA VDS = 16 V, VGS = 0 V IGSSF Gate - Body Leakage, Forward IGSSR ON CHARACTERISTICS Note 2 VGS th |
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